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Thin Film
Thin Film Thickness Reflectometer System NanoCalc

       
The NanoCalc-2000 optical Thin Film Measurement System
is the ideal tool for fast, reliable and easy measurement of transparent and semi-transparent thin layers.

Depending on the layer and substrate material it can measure layers of just a few nanometers up to several hundreds of microns.

The large spectral range available from 250nm (UV) to 1100nm (NIR), as well as our special simulation algorithms allow the non contact thickness measurement not only of standard samples like oxides, nitrides and resists on ideal substrates like silicon wafer or glass but also the measurement of critical layers like DLC (diamond like carbon) on metal, layers on unpolished steel plates or the thickness of transparent foils.

Short measurement time and the very flexible positioning of the fiber head make this optical system the first choice for integration into existing machinery as well as for adaptation to almost any microscope and for in situ process control.

Measurement of multi-layers, 3D-thickness profiling with motorized 150mm or 300mm mapping stage, on-line optical measurement data acquisition and remote control via ActiveX are optionally available.

     
         
         
         

Spectroscopic Ellipsometer System SpecEL-2000-VIS-NIR (UV-VIS-NIR)

       

This compact and easy to use bench-top spectroscopic ellipsometer SpecEL-2000 is the tool of choice for thin film measurement on flat samples like wafers or glass plates, if precise measurements of layers thickness or refractive index, absorption or components ratio is needed. As in reflectometry the basic requirement for successful non contact thickness measurement is at least a semi-transparent film.

Depending on the layer and substrate material it is possible to measure the thickness of thin films in a range of 1nm up to about 5µm.

Compared to reflectometry, spectroscopic ellipsometry has the big advantage of measuring just relative changes in the phase and amplitude of the light instead of absolute intensity. In this way ellipsometry is independent from any reference measurement and multiple parameters can be determined simultaneously.

While using a very powerful analysis software in the background with all different modelling possibilities like Cauchy, OJL,Tauc-Lorentz, Drude, EMA, different kinds of oscillators and many more, the main user interface for standard measurements still allows a very simple one button operation for easy production use.

www.mikropack.de

     
         
Download Nanocalc Brochure (PDF)
       
Download Specel Brochure (PDF)
       
Download Mikropack Products Flyer (PDF)
       
         
   
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