SENSOFAR’s USERS PAPERS
Sensofar’s users papers
Chao Zuo, Qian Chen, Lei Tian, Laura Waller, Anand Asundi - Optics and Lasers in Engineering Volume 71, Pages 20-32
David Pastor, R. Cusco, L. Artus, E. Iborra, J. Jimenez, F. Peiro, G. Gonzalez-Daz, E. Calleja - MRS Proceedings Volume 892
Lauri Kilpi, Oili Ylivaara, Antti Vaajoki, Xuwen Liu, Ville Rontu, Sakari Sintonen, Eero Haimi, Jari Malm, Markus Bosund, M. Tuominen, Timo Sajavaara, Harri Lipsanen, SimoPekka Hannula, Riikka L. Puurunen, Helena Ronkainen - Journal of Vacuum Science Tec
Pablo F. Ibanez-Ibanez, Francisco RuizCabello, Miguel A. CabrerizoVilchez, M. Valverde - Journal of Colloid and Interface Science Volume 608, Pages 792-799
Nerea Otero, Sara Vidal, Felix Ares, Ivette Coto, F. Gontad, Tamara Delgado, Pablo Romero -
Paolo Marizza, Stephan Sylvest Keller, Anette Mullertz, Anja Boisen - Journal of Controlled Release Volume 173, Pages 1-9
Javier Becerra, M.P. Mateo, Pilar Ortiz, G. Nicolas, Ana Paula Zaderenko - Journal of Cultural Heritage Volume 38, Pages 126-135
Christian Schneider, Harald Weigand, Marcus Rohnke - Journal of Vacuum Science Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena Volume 36
Pol Martinez, Carlos Bermudez, Guillem Carles, Cristina Cadevall, Aitor Matilla, Joseph E. Marine, Roger Artigas -
Sergio Mazzoleni, Alessandro Gargani, Roberta Gaia Parcianello, Luca Pezzato, Rachele Bertolini, Andrea Zuccon, Edoardo Stellini, Francesco Saverio Ludovichetti - Applied Sciences Volume 13, Pages 1849-1849
Alberto Minguez-Martinez, J. de Vicente - Materials Volume 12, Pages 4137-4137
Peter Hornak - Ceramics - Silikaty Volume None, Pages 213-222
Xindi Wang, Ningsong Qu, Xiaolong Fang - Journal of Materials Processing Technology Volume 264, Pages 240-248
Ritika Singh Petersen, Stephan Sylvest Keller, Ole Hansen, Anja Boisen - Journal of Micromechanics and Microengineering Volume 25, Pages 055021-055021
J. Pelegrin, Elena Martinez, L.A. Angurel, R. Lahoz, D.W. Hazelton, Paul Brownsey, Jean-Marc Duval - IEEE Transactions on Applied Superconductivity Volume 23, Pages 6601904-6601904
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