SENSOFAR’s USERS PAPERS
Sensofar’s users papers
Gowtham Sivakumar, Jocelyn Jackson, Halil Ceylan, Sriram Sundararajan - Wear Volume 426-427, Pages 212-218
Lubomir Medvecky, Radoslava Stulajterova, Maria Giretova, Jozef Mincik, Marek Vojtko, Jan Balko, Eva Petrovova - Powder metallurgy progress Volume 18, Pages 58-69
Boris Vasilev, Sascha Bott, Roland Rzehak, Romy Liske, Johann W. Bartha - Microelectronic Engineering Volume 104, Pages 48-57
Jose R. A. Godinho, Sandra Piazolo, Lena Z. Evins - Geochimica et Cosmochimica Acta Volume 86, Pages 392-403
Amelia LoeschZhang, Tobias Meckel, Markus Biesalski, Andreas Geiler - Coatings Volume 14, Pages 364-364
Alexandra Gruzdenko, Dirk J. Mulder, Albertus P. H. J. Schenning, Jaap M. J. den Toonder, Michael G. Debije - ACS Applied Materials Interfaces Volume 16, Pages 22696-22703
Jessica R. Scott - Mammalia Volume 76
K. Wieczerzak, Johann Michler, Jeffrey M. Wheeler, Sebastian Lech, R. Chulist, . Gondek, J. Czub, A. Hoser, Norbert Schell, Piotr Baa - Materials Design Volume 188, Pages 108438-108438
Juliane Fjelrad Christfort, Antonio Jose Guillot, Ana Melero, Lasse Hjlund Eklund Thamdrup, Teresa Garrigues, Anja Boisen, Kinga Zor, Line Hagner Nielsen - Pharmaceutics Volume 12, Pages 355-355
Pedro Calleja, J. Esteve, Paula Cojocaru, Luca Magagnin, E. Valles, E. Gomez - Electrochimica Acta Volume 62, Pages 381-389
Amal Charles, Ahmed Elkaseer, Lore Thijs, Veit Hagenmeyer, Steffen Scholz - Applied Sciences Volume 9, Pages 1256-1256
M.A. Urchegui, M. Hartelt, Rolf Wasche, X. Gomez - Tribotest Volume 14, Pages 43-57
YaYu Hsieh, Hung-Ta Hsu, Martin T. Lin, YiShao Lai, Shuhui Chen -
Andrea Arcifa, Antonella Rossi, Rosa M. EspinosaMarzal, Nicholas D. Spencer - The Journal of Physical Chemistry C Volume 118, Pages 29389-29400
N. I. Iakovleva, K. O. Boltar, M. V. Sedneva, A. A. Lopukhin, E. D. Korotaev - Journal of Communications Technology and Electronics Volume 61, Pages 348-351
