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Metrological characterization of different methods for recovering the optically sectioned image by means of structured light

Optische Metrologie, Unkategorisiert
F&E-Techniker, BSc in Physik, MSc in Photonik at Sensofar Metrology | Other articles

Pol stieß im Rahmen des Praktikums für seinen Bachelor zu Sensofar. Seither ist er in der F&E-Abteilung tätig. Er prüft die messtechnische Leistung der Systeme von Sensofar, entwickelt neue Algorithmen für optische Techniken und verbessert die bestehende Technologien. Derzeit promoviert er an der Polytechnischen Universität von Katalonien (UPC) in Zusammenarbeit mit Sensofar über ultraschnelle optische Sensoren für die Oberflächenmesstechnik. Seine Hauptforschungsinteressen sind optisches Design und optische Metrologie.

Abstract

Imaging confocal microscopy (ICM) and focus variation (FV) are two of the most used technologies for 3D surface metrology. Both methods rely on the depth of focus of the microscope objective, which depends on its numerical aperture and wavelength of the light source to compute an optical section. In this paper we study how several methods of structured illumination microscopy affect the metrological characteristics of an areal optical profiler. We study the effect of the projection of different structured patterns, the sectioning algorithms, and the use of high and low frequency components onto the optically sectioned image. We characterized their performance in terms of system noise, instrument transfer function and metrological characteristics such as roughness parameters and step height values.

Other publications

cs21 Linkam - silicon wafer Hsuper-resolved-3d-optical-profiling-for-surface-metrology-using-structured