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Optical metrology

Development of confocal-based techniques for shape measurements on structured surfaces containing dissimilar materials

Optical metrology
软件副总裁,物理学博士(光学工程),电信技术工程,电子工程 at Sensofar Metrology

2004 年成为 Sensofar 的合伙人。
Cristina 是经验丰富的研发专家,自 1996 年起便在 CD6 担任研发工程师,而自 Sensofar Tech SL 于 2001 年成立以来,她一直担任软件经理,并自 2017 年起担任软件副总裁。她的研究方向包括光学测量、表面形貌测量学、图像处理和计算科学。她从 2010 年起开始研发三维 (3D) 形貌分析在枪支分析中的使用。


One of the applications, which is considered to be very difficult to carry out with most optical imaging profilers, is the shape and texture measurements of structured surfaces obtained from the superposition of various micro or sub-micrometric layers of dissimilar materials. Typical examples are the architectures of microelectronics samples made up of Si, SiO2, Si3N4, photoresists and metal layers. Because of the very different values of the index of refraction of the involved materials, visible light is reflected in the various interfaces. As a result, some reflected wavefronts are superposed giving rise to interference patterns, which are difficult to understand in terms of surface topography and layer thickness. In this paper we introduce a new method based on non-contact confocal techniques to measure the shape of structured samples. The method is based on the comparison of the axial responses obtained in areas of the surface where there is a layer and in other areas where there is just the substrate. To our knowledge, this approach enables the confocal profilers to measure the thickness of layers on the sub-micrometric scale for the first time.

3D shape and texture measurements