Presenting cutting-edge scientific papers at SPIE 23
At Sensofar, we proudly announce the presentation of two groundbreaking scientific papers developed by our team members, Narcís Vilar and Lena Zhukova. The papers, titled “Robust measurement of surface topography for additive manufacturing using imaging confocal microscopy” by Narcís Vilar and “Computational self-correction of scanning nonlinearities in optical profilometry” by Lena Zhukova, will be unveiled at the highly anticipated SPIE optical metrology 23, held in Munich.
Author(s): Narcís Vilar, Roger Artigas, Sensofar-Tech, S.L. (Spain); Martí Duocastella, Univ. de Barcelona (Spain); Guillem Carles Santacana, Sensofar-Tech, S.L. (Spain)
27 June 2023 • 10:50 – 11:10 CEST | ICM Room 14c
Narcis Vilar’s paper presents an optimized optical system for measuring surface texture on additive manufacturing (AM) parts. The system features a wide field of view and a high numerical aperture, addressing challenges posed by surface irregularities and variations in reflectivity. Integrating a commercially available objective with a custom-designed tube lens achieves magnification and an effective numerical aperture suitable for AM part characterization. The system employs the confocal-like HiLo technique and successfully characterizes metal AM parts. The design of a microscope objective with increased performance potential is also discussed. Additionally, using high dynamic range (HDR) approaches, combining multiple low dynamic range images, enables the reconstruction of a single topography map to tackle reflectivity variations. Overall, the paper confirms how this optical system, with its wide spatial feature coverage and HDR capability, offers a versatile solution applicable in various scientific and industrial contexts.
Computational self-correction of scanning nonlinearities in optical profilometry
Author(s): Lena Zhukova, Roger Artigas, Guillem Carles Santacana, Sensofar-Tech, S.L. (Spain)
27 June 2023 • 12:30 – 12:50 CEST | ICM Room 14c
On the other hand, Lena Zhukova‘s paper focuses on a computational method to reduce non-linearities in optical profilometers that use motorized linear stages for scanning. By analyzing two topographies separated by a known displacement — which can be extracted from a single scan —, the algorithm predicts and eliminates positioning system errors, significantly enhancing measurement precision. This zero-cost solution offers a practical and effective way to address non-linearity issues in motorized linear stages, expanding the applicability of optical profilometry across industries and research fields.
The SPIE optical metrology, renowned for showcasing cutting-edge advancements in photonics and related technologies, provides an ideal platform for Vilar and Zhukova to share their pioneering research with the global scientific community. Sensofar commends their exceptional contributions and looks forward to the profound impact their work will have on the field of metrology.
