CMP工程における製造現場でのパッド面モニタリング用の計測
CMP工程のあらゆる段階で表面間の機械的相互作用が重要な可変要素であるとすれば、CMP工程における表面計測の必要性は明らかです。工程を通じて定期的に特性評価が必要な表面は、調整盤、ウエハー、パッドの表面です。
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CMP工程のあらゆる段階で表面間の機械的相互作用が重要な可変要素であるとすれば、CMP工程における表面計測の必要性は明らかです。工程を通じて定期的に特性評価が必要な表面は、調整盤、ウエハー、パッドの表面です。
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