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Optical metrology

Micromeasurements on smooth surfaces with a new confocal optical profiler

Optical metrology
Sensofar Metrology 名誉主席,Sensofar Medical 总裁兼首席执行官,物理学博士 | Other articles

2001 年的 Sensofar 创始成员,2012 年的 Sensofar Medical 创始成员。
他在巴塞罗那理工学院 (UPC) 开启了学术生涯,BCN 光学工程教授,光子学硕士,CD6 的创始成员和前任主任(CD6 是隶属于 UPC 的技术创新中心,并被加泰罗尼亚政府认可为 TECNIO 网络成员)。
他是 150 多篇科学文献的作者,10 篇硕士和博士论文的导师,3 项国际家族专利的发明者,负责由国家和欧洲公共机构以及私营公司资助的 50 多个研究项目。
他还领导了“南欧光子学和光学集群”(SECPhO) 的创建,管理过一家专注于高科技投资的风险投资公司长达 14 年之久。

Micromeasurements on smooth surfaces with a new confocal optical profiler full article
Ferran Laguarta1, Roger Artigas1, Agustí Pintó1 and I. Al-Khatib1 
1Center for Sensors, Instruments and Systems Development (CD6), Universitat Politècnica de Catalunya (UPC) Rambla Sant Nebridi, 10, E-08222 Terrassa, Spain.
Proceedings Volume 3520, Three-Dimensional Imaging, Optical Metrology, and Inspection IV; (1998)
Event: Photonics East (ISAM, VVDC, IEMB), 1998, Boston, MA, United States

Abstract

The surface metrology market toady is moving towards non- contact modular computer-controlled system for measuring and analyzing roughness, contour and topography. In this paper we present a new optical instrument based on the concept of confocal microscopy. In this instrument, which is especially suitable for measurements on smooth surfaces, either a pinhole or a structured light pattern in imaged by a very high numerical aperture optical system on the surface of the sample to be measured. The reflected light is observed with a CCD array and analyzed with different image data processing algorithms. Two different experimental prototypes were developed to allow the measurement not only of surfaces with good accessibility but also of those with intricate geometries, difficult access and small dimensions. Various samples such as high precision optical surfaces, master gratings, and diamond drawing dies were measured. All the results obtained show that the confocal optical profiler is robust enough to provide a surface topography with spatial resolution lower than 1 micrometers and uncertainty about 10 nm. In addition to the replacement of the existing stylus system, there are also important new potential applications for this kind of instrument.

Three-dimensional micromeasurements